Function：Used for the fabrication of micro- and nano-scale patterned structures. Supports thermal nanoimprint, UV nanoimprint, and combined thermal and UV nanoimprint processes.

Function：1. Stage travel range: X-axis 300 mm, Y-axis 300 mm, Z-axis 60 mm; 2. Maximum substrate size: 250 mm × 250 mm; 3. Self-priming ink supply for the printhead; 4. Minimum achievable linewidth: ≤ 30 μm; 5. Supported ink viscosity: ≤ 450 cps; 6. Capable of printing continuous (non-discrete) microstructures, including lines and films formed in a single continuous process; 7. Droplet deposition without impact on the substrate, eliminating satellite droplets； 8. Editable pattern geometries: dot arrays, continuous lines, polylines, arcs, and continuous thin films; 9. Equipped with a real-time CCD video monitoring system.