Novel Nanoelectronic / Optoelectronic Devices - Process Integration - Process Capabilities

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Process Integration

Novel Nanoelectronic / Optoelectronic Devices

Optical Communication Device & Chip Fabrication
Novel Nanoelectronic / Optoelectronic Devices
CMOS Processes
Micro-Nano Optical Device Fabrication
MEMS / Microfluidic Chip Fabrication
Heterogeneous Integrated Advanced Packaging

Optical Communication Device & Chip Fabrication
Novel Nanoelectronic / Optoelectronic Devices
CMOS Processes
Micro-Nano Optical Device Fabrication
MEMS / Microfluidic Chip Fabrication
Heterogeneous Integrated Advanced Packaging

Novel Nanoelectronic / Nanophotonic Devices

The platform provides various nanolithography capabilities (including EBL, DUV, NIL, DWL, FIB, etc.), along with corresponding micro/nanofabrication and characterization methods, enabling proof-of-principle validation of novel nanoelectronic and nanophotonic devices.

Vertical heterostructure photodetector based on black phosphorus/carbon nanotube thin films

(Figure provided by: Prof. Changxin Chen’s research group, Shanghai Jiao Tong University)